首页> 外文期刊>Ferroelectrics: Letters Section >MEASUREMENT OF THE DIFFERENTIAL POCKELS AND KERR COEFFICIENTS OF THIN FILMS BY A TWO-BEAM POLARIZATION INTERFEROMETER WITH A REFLECTION CONFIGURATION
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MEASUREMENT OF THE DIFFERENTIAL POCKELS AND KERR COEFFICIENTS OF THIN FILMS BY A TWO-BEAM POLARIZATION INTERFEROMETER WITH A REFLECTION CONFIGURATION

机译:带有反射构型的两束偏光干涉仪测量薄膜的微孔和柯尔系数

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摘要

A simple procedure for the measurement of the linear and quadratic electrooptic coefficients of thin films by two-beam polarization (TBP) interferometery is developed. Differential electrooptic coefficients that allow clear mathematical definition and can be measured using a modulation method are introduced. It is shown that a TBP interferometer allows measuring both differential Pockels and Kerr coefficients of a thin film with a strong Fabry-Perot (FP) effect that is already present in thin films without special antireflection coating. The measured values of the electrooptic coefficients of PZT thin film are in agreement with the known data.
机译:建立了一种通过两光束偏振(TBP)干涉仪测量薄膜的线性和二次电光系数的简单程序。介绍了差分电光系数,该系数允许清晰的数学定义并且可以使用调制方法进行测量。结果表明,TBP干涉仪可以测量具有强Fabry-Perot(FP)效应的薄膜的差分普克尔系数和Kerr系数,而在没有特殊抗反射涂层的情况下,这种效应已经存在于薄膜中。 PZT薄膜的电光系数的测量值与已知数据一致。

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