Determination of trace silicon in zirconium matrices and steels by inductively coupled plasma-atomic emission spectrometry

摘要

The determination of trace silicon by inductivelycoupled plasma-atomic emission spectrometry in samplescontaining HF is inhibited by the high blank caused by attack of thequartz torch. Use of a proprietary commercial amine to neutralizethe HF and increase the pH to between 7 and 7.5 allows thesimultaneous determination of silicon and other impurities inzirconium or zircaloy samples. The determination of silicon insteels requires the addition of an auxiliary complexing agent to theamine solution to prevent precipitation of iron (III). The analyticalresults obtained for several Standard Reference Materials (SRMs)with and without the amine reagent agree well with one another,and also with the certified values.