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Effects of In Situ Heat Treatment on the Microstructure and Electronic Properties of Ba0.6Sr0.4TiO3 Thin Films

机译:原位热处理对Ba0.6Sr0.4TiO3薄膜微结构和电子性能的影响

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摘要

Ba0.6Sr0.4TiO3 (BST) thin films were deposited on Pt/Ti/SiO2/Si substrates by a RF-magnetron sputtering. The film crystallinity was influenced by the in situ heat treatment. The surface images, dielectric and ferroelectric properties of the thin films were investigated. The BST thin films deposited at 400 degrees C were crystallized after heat treatment over 500 degrees C for 20 minutes. The high dielectric constant of 320 and dielectric tunability of 30% was achieved in the BST thin films while the dielectric loss was less than 0.05 by adjusting the annealing temperature. And the thin films exhibited strong ferroelectric property when the film thickness was over 90 nm.
机译:Ba0.6Sr0.4TiO3(BST)薄膜通过RF磁控溅射沉积在Pt / Ti / SiO2 / Si衬底上。膜的结晶度受原位热处理的影响。研究了薄膜的表面图像,介电和铁电性能。在500摄氏度下热处理20分钟后,在400摄氏度下沉积的BST薄膜结晶。通过调节退火温度,在BST薄膜中实现了320的高介电常数和30%的介电可调性,而介电损耗小于0.05。并且当膜厚度超过90nm时,薄膜表现出强的铁电性能。

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