Microstructures and Dielectric Properties of MgTiO_3 Thick Film Prepared Using Aerosol Deposition Method

摘要

The aerosol deposition method {ADM) enables the deposition of films on a substrate at room temperature. In this study, we have focused on the effects of different gases and fluxes on the dielectric properties and microstructures of a MgTiO_3 film. The crystal structures of the MgTiO_3 film do not change with the gas and flux. The widths of the peaks on the X-ray diffraction patterns in the case of the MgTiO_3 film are broader than that for the MgTiO_3 raw powder; the surface roughness also increases with the gas flux. The fine grains are oriented randomly and are deformed by impaction; they stack alternately to form a lamellar structure. Polycrystalline MgO crystals are observed in between the MgTiO_3 grains; they play an important role in enhancing the film formation. The capacitance remains constant with bias in the C-V curve. In the I-V curve, the leakage current is low at approximately 4 × 10~(-13) ~ 5.5 × 10~(-12) A/cm~2 and 3 × 10~(-12) ~ 1.3 × 10~(-11) A/cm~2 with gas fluxes of 3L and 5 L, respectively.