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Interlamellar Silylation of Montmorillonite with 3-Aminopropyltriethoxysilane

机译:蒙脱土与3-氨基丙基三乙氧基硅烷的层间硅烷化

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摘要

H-montmorillonite was modified by interlayer surface silylation using 3-aminopropyltriethoxysilane and dodecylamine in ethanol without a pre-swelling step.Dodecylamine acts as a gallery expander and silylation catalyst.The evaporation of ethanol from the dispersion yields well-ordered silylated montmorillonites with large basal spacing between 1.50 and 4.20 nm.Solid-state ~(29)Si CP MAS NMR of the silylated samples showed Q~2 and Q~3 signals as well as T~2 and T~3 signals.The increase in the relative intensity of Q~3 for Q~2 and the appearance of T~2 and T~3 signals was attributed to the grafting of 3-aminopropyltriethoxysilane to the interlayer surface silanol groups.
机译:H-蒙脱石是通过3-氨基丙基三乙氧基硅烷和十二烷基胺在乙醇中的层间表面甲硅烷基化而改性的,而无需预溶胀步骤;十二烷基胺可作为画廊膨胀剂和甲硅烷基化催化剂;乙醇从分散体中的蒸发会产生有序的甲硅烷基化蒙脱石,具有较大的基础甲硅烷基化样品的固态〜(29)Si CP MAS NMR谱图显示Q〜2和Q〜3信号以及T〜2和T〜3信号。 Q〜2的Q〜3以及T〜2和T〜3信号的出现归因于3-氨基丙基三乙氧基硅烷接枝到层间表面硅烷醇基团上。

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