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Synthesis of Isopropyldichlorosilane by Direct Process

机译:直接法合成异丙基二氯硅烷

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Direct reaction of elemental silicon with a gaseous mixture of isopropyl chloride (1) and hydrogen chloride in the presence of copper catalyst using a stirred bed reactor equipped with a spiral band agitator gave isopropyldichlorosilane having a Si-H bond (2a) as a major product and isopropyltrichlorosilane (2b) along with chlorosilanes,trichlorosilane and tetrachlorosilane.A process for production of 2a was maximized using the 1:0.5 mole ratio of 1 to HC1 and smaller size of elemental silicon at a reaction temperature of 220 °C.When a reaction was carried out by feeding a gaseous mixture of 1 [12.9 g/h (0.164 mol/h)] and HC1 [2.98 g/h (0.082 mol/h)] to a contact mixture of elemental silicon (360 g) and copper (40 g) under the optimum condition for 45 h,2a among volatile products kept up about 82 mol % until 35 h and then slowly decreased down 68 mol % in 45 h reaction.Finally 2a was obtained in 38% isolated yield (based on 1 used) with an 85% consumption of elemental silicon in a 45 h reaction.In addition to 2a,2b was obtained as minor product along with chlorosilanes,trichlorosilane,and tetrachlorosilane.The decomposition of 1 was suppressed and the production of 2a improved by adding HC1 to 1.
机译:使用配备有螺旋带式搅拌器的搅拌床反应器,在铜催化剂存在下,在铜催化剂存在下,元素硅与异丙基氯(1)和氯化氢的气体混合物直接反应,得到具有Si-H键(2a)的异丙基二氯硅烷在反应温度为220°C的条件下,使用1:0.5的HCl摩尔比和较小尺寸的元素硅,可最大程度地提高2a的生产工艺.2a的生产方法包括氯硅烷,三氯硅烷和四氯硅烷。将1 [12.9 g / h(0.164 mol / h)]和HCl [2.98 g / h(0.082 mol / h)]的气体混合物进料到元素硅(360 g)和铜( 40 g)在最佳条件下反应45 h,2a的挥发性产物在35 h内保持约82 mol%,然后在45 h反应中缓慢下降至68 mol%。最后得到2a,分离产率为38%(基于1在45小时内消耗了85%的元素硅除了2a,2b外,还与氯硅烷,三氯硅烷和四氯硅烷一起作为次要产物获得.1加入HCl抑制了1的分解并提高了2a的产量。

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