首页> 外文期刊>Bulletin of the Korean Chemical Society >Preparation and Characterization of a Triple Layered Au-PMMA-PbSe Hybrid Nanocomposite: Manipulation of PMMA Spacer Layer by Oxygen Plasma Etching
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Preparation and Characterization of a Triple Layered Au-PMMA-PbSe Hybrid Nanocomposite: Manipulation of PMMA Spacer Layer by Oxygen Plasma Etching

机译:三层Au-PMMA-PbSe杂化纳米复合材料的制备与表征:氧等离子体刻蚀对PMMA间隔层的处理

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A hybrid triple-layered nanocomposite structure of plasmonic gold (Au), polymethylmethacrylate (PMMA), and lead selenide (PbSe) quantum dot (QD) on quartz substrate was developed. The fabricated nanocomposite exhibited well-established triple-layered morphology (Au-PMMA-QD on quartz), but had different coupling distances between Au, on the bottom, and PbSe QD, on the top. Control of the coupling distances in terms of different thicknesses of a PMMA spacer layer was examined by etching for different durations, from 7 to 30min. The corresponding thicknesses of the PMMA layer ranged from 3.8 to 88nm at an etching rate of 2nm/min. Atomic force microscopy measurements showed that the well-established triple-layered hybrid nanocomposite structure had the heights of 15nm (Au) and 4nm (PbSe QD). X-ray photoelectron spectroscopy results revealed the characteristic peaks assigned to each nanoparticle and polymer layer. The results illustrated the triple-layered structures with different PMMA spacer layers, with no cross interference between the layers.
机译:在石英衬底上开发了等离子体金(Au),聚甲基丙烯酸甲酯(PMMA)和硒化铅(PbSe)量子点(QD)的混合三层纳米复合结构。制成的纳米复合材料表现出良好的三层形态(石英上为Au-PMMA-QD),但底部的Au和顶部的PbSe QD之间具有不同的耦合距离。通过蚀刻7到30分钟的不同持续时间来检查根据PMMA间隔层的不同厚度的耦合距离的控制。 PMMA层的相应厚度以2nm / min的蚀刻速率在3.8至88nm的范围内。原子力显微镜测量表明,完善的三层杂化纳米复合材料结构的高度为15nm(Au)和4nm(PbSe QD)。 X射线光电子能谱结果显示了分配给每个纳米颗粒和聚合物层的特征峰。结果表明具有不同PMMA间隔层的三层结构,各层之间没有交叉干扰。

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