MICRO- AND NANOSTRUCTURING OF CRYSTALLINE SILICON SURFACE UNDER FEMTOSECOND LASER PULSES

摘要

Periodic structures formed in the surface layer of crystalline silicon exposed to high-intensity femtosecond laser pulses were studied. It was shown that the orientation dependence of the third harmonic in the microstructure is controlled by its morphology. Diagnostics of the irradiated region by photoluminescence and Raman scattering methods suggests the formation of silicon nanostructures.