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首页> 外文期刊>Bulletin of Materials Science >In situ high temperature XRD studies of ZnO nanopowder prepared via cost effective ultrasonic mist chemical vapour deposition
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In situ high temperature XRD studies of ZnO nanopowder prepared via cost effective ultrasonic mist chemical vapour deposition

机译:ZnO纳米粉体的现场高温XRD研究,其成本效益高,超声雾化学气相沉积法制备

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摘要

Ultrasonic mist chemical vapour deposition (UM-CVD) system has been developed to prepare ZnO nanopowder. This is a promising method for large area deposition at low temperature inspite of being simple, inexpensive and safe. The particle size, lattice parameters and crystal structure of ZnO nanopowder are characterized by in situ high temperature X-ray diffraction (XRD). Surface morphology of powder was studied using transmission electron microscopy (TEM) and field emission electron microscope (FESEM). The optical properties are observed using UV-visible spectrophotometer. The influence of high temperature vacuum annealing on XRD pattern is systematically studied. Results of high temperature XRD showed prominent 100, 002 and 101 reflections among which 101 is of highest intensity. With increase in temperature, a systematic shift in peak positions towards lower 2 theta values has been observed, which may be due to change in lattice parameters. Temperature dependence of lattice constants under vacuum shows linear increase in their values. Diffraction patterns obtained from TEM are also in agreement with the XRD data. The synthesized powder exhibited the estimated direct bandgap (E_g) of 3 centre dot 43 eV. The optical bandgap calculated from Tauc's relation and the bandgap calculated from the particle size inferred from XRD were in agreement with each other.
机译:已经开发了超声雾化学气相沉积(UM-CVD)系统来制备ZnO纳米粉。尽管简单,便宜和安全,这仍是在低温下进行大面积沉积的有前途的方法。通过原位高温X射线衍射(XRD)表征了ZnO纳米粉的粒度,晶格参数和晶体结构。使用透射电子显微镜(TEM)和场发射电子显微镜(FESEM)研究了粉末的表面形态。使用紫外可见分光光度计观察光学性质。系统地研究了高温真空退火对XRD图形的影响。高温XRD结果显示出明显的100、002和101反射,其中101强度最高。随着温度的升高,已经观察到峰位置朝着较低的2 theta值的系统偏移,这可能是由于晶格参数的变化。真空下晶格常数的温度依赖性显示其值呈线性增加。从TEM获得的衍射图也与XRD数据一致。合成粉末显示出3个中心点43 eV的估计直接带隙(E_g)。根据Tauc关系式计算出的光学带隙和根据XRD推断出的粒径计算出的带隙彼此一致。

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