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Determination of trap cross-section in a-Si:H p-i-n diodes parameters using simulation and parameter extraction

机译:使用仿真和参数提取确定a-Si:H p-i-n二极管中的陷阱截面参数

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摘要

Modeling the current density-voltage (J-V) curve of a-Si:H p-i-n diodes requires a group of input physical parameters that have to be previously determined. Some of them can be determined directly from experiment, while others, as the trap cross-section, have to be indirectly determined or assigned. We present a simple procedure to estimate trap cross-section using computer simulation and parameter extraction. The experimental J-V forward characteristic of the p-i-n diode, dark and illuminated, is used to determine the ideality factor n and the short circuit current density J{sub}(sc). The charged trap cross-section and its relation to the neutral trap cross-section are determined by fitting to tabulated and graphical results from simulation. Determined values of trap cross-section are used to simulate the reverse current of diodes under illumination and results compared with experimental curves.
机译:对a-Si:H p-i-n二极管的电流密度-电压(J-V)曲线进行建模需要一组输入物理参数,这些参数必须事先确定。其中一些可以直接从实验中确定,而另一些则作为陷阱横截面,必须间接确定或分配。我们提出了一种使用计算机模拟和参数提取来估计陷阱横截面的简单程序。p-i-n二极管的实验J-V正向特性(暗和亮)用于确定理想因子n和短路电流密度J{sub}(sc)。带电陷阱截面及其与中性陷阱截面的关系是通过拟合仿真的表格和图形结果来确定的。利用确定的陷阱截面值模拟了二极管在光照下的反向电流,并与实验曲线进行了比较。

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