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Current efficiency and polarization behavior of trivalent chromium electrodeposition process

机译:三价铬电沉积工艺的电流效率和极化行为

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The influence of bath composition, mass transfer and applied potential on the trivalent chromium electrodeposition from a bath containing ammonium formate and sodium acetate as the complexing agents was studied by the potentiostatic current efficiency and rotating disk electrode experiments. The results indicate that the chromium electrodeposition process involved two consecutive reduction steps. The first step was the reduction of a trivalent-Cr complex ion to a divalent-Cr complex ion: [Cr(H{sub}20){sub}5L]{sup}(2+) + e{sup}- → [Cr(H{sub}20){sub}5L]{sup}+ where L{sup}- represents the complexing [formate]{sup}- or [acetate]{sup}- ligand. This was followed by the reduction of the divalent-Cr complex ion to metallic Cr(s): [Cr(H{sub}20){sub}5L]{sup}+ + 2e{sup}- → Cr(s) + 5H{sub}20 + L{sup}-. The rate of Cr deposition process was controlled by the transport of the trivalent-Cr complex ion, [Cr(H{sub}20){sub}5L]{sup}(2+), to the cathode surface.
机译:通过恒电位电流效率和转盘电极实验研究了镀液组成,传质和施加电势对以甲酸铵和乙酸钠为络合剂的镀液中三价铬电沉积的影响。结果表明,铬电沉积过程涉及两个连续的还原步骤。第一步是将三价铬络合物离子还原为二价铬络合物离子:[Cr(H {sub} 20){sub} 5L] {sup}(2+)+ e {sup}-→[ Cr(H {sub} 20){sub} 5L] {sup} +,其中L {sup}-表示络合的[甲酸酯] {sup}-或[乙酸酯] {sup}-配体。然后将二价铬络合物离子还原为金属Cr:[Cr(H {sub} 20){sub} 5L] {sup} + + 2e {sup}-→Cr(s)+ 5H {sub} 20 + L {sup}-。 Cr沉积过程的速率由三价Cr络离子[Cr(H {sub} 20){sub} 5L] {sup}(2+)传输到阴极表面控制。

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