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Impedance spectroscopy of semiconducting films on tin electrodes

机译:锡电极上半导体膜的阻抗谱

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Impedance spectroscopy and cyclic voltammetry measurements were used to examine solid-state properties of thin anodic films on tin. The impedance of tin│n-type SnO{sub}2│electrolyte system was studied as a function of applied potential and frequency. In the absence of illumination at room temperature, the impedance spectroscopy technique when used in conjunction with an applied bias potential can be a powerful tool for identification of deep-level states. An electrical equivalent circuit corresponding to the Voight model, which describes the behavior of the passive film on tin more adequately than the models for 'classical' semiconductors, is presented. The change in the Mott-Schottky plot was interpreted in terms of partial ionization of deep-level states. The resistive component of the impedance measured at low frequencies was much more sensitive to deep-level states than the capacitive one and was used to determine their distribution in the bulk of SnO{sub}2. Both flat-band potential and donor concentration were estimated from the space charge capacitance at high frequencies. The dielectric properties of the oxide film were discussed and several parameters were determined in terms of a parallel plate capacitor and in accordance with the high-field growth law.
机译:阻抗光谱法和循环伏安法测量用于检查锡上阳极薄膜的固态特性。研究了锡│n型SnO {sub}2│电解质体系的阻抗随施加电势和频率的变化。在室温下没有照明的情况下,将阻抗谱技术与施加的偏置电势结合使用可以成为识别深层状态的强大工具。提出了与Voight模型相对应的等效电路,该电路比“经典”半导体模型更充分地描述了锡上无源膜的行为。莫特-肖特基图中的变化是根据深层态的部分电离来解释的。在低频下测得的阻抗的电阻性分量对深层状态的敏感度远大于电容性状态,并用于确定其在SnO {sub} 2主体中的分布。平坦带电势和施主浓度均由高频下的空间电荷电容估算得出。讨论了氧化膜的介电性能,并根据平行平板电容器并根据高场生长定律确定了几个参数。

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