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首页> 外文期刊>Electrochimica Acta >Ellipsometric and photocurrent characterization of oxide films formed on copper in borax solution with and without benzotriazol
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Ellipsometric and photocurrent characterization of oxide films formed on copper in borax solution with and without benzotriazol

机译:含和不含苯并三唑的硼砂溶液中铜上形成的氧化膜的椭偏和光电流表征

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摘要

The effect of the addition of benzotriazol on the passive behaviour of copper in borax solutions was analyzed in the potential region -0.32 to 0.71 V vs. RHE using voltammetric, photocurrent and ellipsometric techniques. Oxide formation can beexplained as a sequence of Cu{sub}2O growth (inner layer ippl) and dissolution precipitation of Cu(II), (outer hydrated oxide layer (oppl)). The resulting photocurrent was proportional to the thickness of the ippl. However, significant variations in theamplitude and phase of the photocurrent were detected as a function of the potential region and the composition of the electrolyte. These effects are related to changes in the excess of cations accumulated in the ippl.
机译:使用伏安法,光电流法和椭偏技术,在相对于RHE的电位区域-0.32至0.71 V下,分析了添加苯并三唑对铜在硼砂溶液中的钝化行为的影响。氧化物的形成可以解释为Cu {sub} 2O的生长(内层ippl)和Cu(II)的溶解沉淀(外水合氧化物层(oppl))的顺序。产生的光电流与ippl的厚度成比例。然而,检测到光电流的幅度和相位的显着变化是电位区域和电解质组成的函数。这些影响与ippl中累积的过量阳离子的变化有关。

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