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首页> 外文期刊>Electrochimica Acta >Halogen adsorption on crystallographic (111) planes of Pt, Pd, Cu and Au, and on Pd-monolayer catalyst surfaces: First-principles study
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Halogen adsorption on crystallographic (111) planes of Pt, Pd, Cu and Au, and on Pd-monolayer catalyst surfaces: First-principles study

机译:Pt,Pd,Cu和Au的结晶(111)面上以及Pd单层催化剂表面上的卤素吸附:第一性原理研究

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摘要

Halogen (Cl, Br and I) adsorption on crystallographic (111) planes of Pd, Pt, Cu, Au and on palladium monolayer catalysts surfaces was investigated by DFT calculations. Palladium monolayer catalyst here denotes either the Pd monolayer deposited over (111) crystallographic plane of Pt, Cu and Au monocrystals(Pd_(ML)/Me(111)),or the(111) crystallographic plane of Pd monocrystal with inserted one-atom thick surface underlayer of Pt, Cu and Au (Me_(UND)/Pd(111)). The adsorption on the 3-fold sites was found to be the strongest, and adsorption energies decreased if the size of the halogen atoms increased. For the Case of Pd-monolayer catalysts it was demonstrated that energy of adsorption of halogen atoms could be correlated to the position of the d-band of surface atoms. Charge states of halogen adatoms and work function changes were evaluated. On the basis of calculated data and both experimental and theoretical data available in the literature, the changes in the catalytic activity toward oxygen reduction reaction of the Pd_(ML)/Pt(111) surface, caused by chloride adsorption, were discussed.
机译:通过DFT计算研究了Pd,Pt,Cu,Au的结晶(111)面上以及钯单层催化剂表面上的卤素(Cl,Br和I)吸附。钯单层催化剂在此表示沉积在Pt,Cu和Au单晶(Pd_(ML)/ Me(111))的(111)晶面上的Pd单层,或插入一个原子的Pd单晶的(111)晶面上Pt,Cu和Au的厚表面底层(Me_(UND)/ Pd(111))。发现三折位上的吸附最强,并且如果卤素原子的尺寸增加,则吸附能降低。对于Pd单层催化剂,已证明卤素原子的吸附能可能与表面原子d带的位置有关。评价了卤素原子的电荷状态和功函数的变化。根据计算数据以及文献中的实验数据和理论数据,讨论了氯化物吸附引起的Pd_(ML)/ Pt(111)表面对氧还原反应的催化活性变化。

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