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首页> 外文期刊>Electrochimica Acta >Characterization of Al-doped spinel LiMn{sub}2O{sub}4 thin film cathode electrodes prepared by Liquid Source Misted Chemical Deposition (LSMCD) technique
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Characterization of Al-doped spinel LiMn{sub}2O{sub}4 thin film cathode electrodes prepared by Liquid Source Misted Chemical Deposition (LSMCD) technique

机译:液源雾化化学沉积(LSMCD)技术制备的掺铝尖晶石LiMn {sub} 2O {sub} 4薄膜阴极的表征

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摘要

A novel process called Liquid Source Misted Chemical Deposition (LSMCD) was used to synthesize Al-doped LiMn{sub}2O{sub}4 cathode films for Lithium microbatteries. The cathode films were characterized by XRD, SEM, cyclic volatmmetry, and charge/discharge test. LiMn{sub}1.8Al{sub}0.2O{sub}4 film crystallized at 800℃ in rapid thermal annealing (RTA) for 5min under oxygen atmosphere exhibited more improved electrochemical rechargeability than spinel LiMn{sub}2O{sub}4 film because the substitution of Al{sup}(3+) for Mn{sup}(3+) increased Mn-O bonding strength in the spinel framework and suppressed the two-phase behavior of the unsubstituted spinel during the intercalation/deintercalation that is the origin of the failure mechanism in the 4 V region. As a result, LiMn{sub}1.8Al{sub}0.2O{sub}4 film showed an initial discharge capacity of 52 μAh/cm{sup}2 μm and no capacity fade over 100 cycles.
机译:一种称为液体源雾化化学沉积(LSMCD)的新工艺被用于合成铝掺杂的LiMn {sub} 2O {sub} 4正极膜的锂微电池。通过XRD,SEM,循环伏安法和充电/放电测试来表征阴极膜。 LiMn {sub} 1.8Al {sub} 0.2O {sub} 4薄膜在氧气氛下于800℃的快速热退火(RTA)中结晶5min表现出比尖晶石LiMn {sub} 2O {sub} 4薄膜更好的电化学充电性能,因为用Al {sup}(3+)替代Mn {sup}(3+)可以增加尖晶石骨架中Mn-O的结合强度,并抑制作为根源的插层/脱层过程中未取代的尖晶石的两相行为。 4 V区域中的故障机制。结果,LiMn {sub} 1.8Al {sub} 0.2O {sub} 4膜显示出52μAh/ cm {sup}2μm的初始放电容量,并且在100个循环中没有容量衰减。

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