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A comparative electrochemical and quantum chemical calculation study of BTAH and BTAOH as copper corrosion inhibitors in near neutral chloride solution

机译:中性氯化物溶液中BTAH和BTAOH作为铜缓蚀剂的电化学和量子化学比较研究

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The inhibition of copper corrosion in 3% NaCl solution was studied by using a well-known inhibitor, benzotriazole (BTAH), and its not so extensively explored derivative, 1-hydroxybenzotriazole (BTAOH). Electrochemical methods, i.e., linear polarization, Tafel and potentiodynamic curve measurements and electrochemical quartz crystal microbalance (EQCM) measurements were used. Corrosion parameters and inhibition effectiveness were determined. Experimental results showed that benzotriazole is a more effective inhibitor of the corrosion of copper in chloride media than 1-hydroxybenzotriazole. Whereas in the presence of BTAH a protective Cu-BTA layer is formed on the Cu surface, in the presence of BTAOH a thick, poorly protective layer is formed, which readily dissolves in chloride solution. Kinetic parameters were calculated based on EQCM results. Adsorption of BTAOH follows a linear growth law, in contrast to BTAH, whose film growth can be best represented at first by a parabolic, and later by logarithmic, growth law. Different mechanisms of growth imply different mechanisms of inhibition and account for the different inhibition effectiveness. Density functional theory calculations were performed to characterize certain features of the molecular structures, including the electronic parameters related to the inhibition effectiveness of these inhibitors. Introduction of the -OH group into the benzotriazole molecules does not change their electronic parameters significantly neither in gas phase nor in the presence of water solvent. Other parameters, therefore, affect the inhibition effectiveness of these corrosion inhibitors. In particular, superior inhibition effectiveness of BTAH is attributed to interplay of planar molecular structure, physisorption and intermolecular H-bonding, which cooperatively may result in formation of thin and protective film on the surface.
机译:通过使用一种众所周知的抑制剂苯并三唑(BTAH)及其未广泛研究的衍生物1-羟基苯并三唑(BTAOH)研究了在3%NaCl溶液中抑制铜腐蚀的方法。使用电化学方法,即线性极化,Tafel和电位动力学曲线测量以及电化学石英晶体微量天平(EQCM)测量。确定腐蚀参数和抑制效果。实验结果表明,与1-羟基苯并三唑相比,苯并三唑在氯化物介质中是更有效的铜腐蚀抑制剂。在存在BTAH的情况下,在Cu表面上形成保护性的Cu-BTA层,而在存在BTAOH的情况下,形成了厚的,保护性差的层,该层容易溶解在氯化物溶液中。基于EQCM结果计算动力学参数。与BTAH相比,BTAOH的吸附遵循线性增长定律,而BTAH的薄膜生长首先可以用抛物线表示,然后用对数增长定律表示。不同的生长机制意味着不同的抑制机制,并说明了不同的抑制效果。进行密度泛函理论计算以表征分子结构的某些特征,包括与这些抑制剂的抑制作用有关的电子参数。将-OH基团引入到苯并三唑分子中无论在气相中还是在水溶剂的存在下都不会显着改变其电子参数。因此,其他参数影响这些腐蚀抑制剂的抑制效果。尤其是,BTAH的优异抑制效果归因于平面分子结构,物理吸附和分子间氢键的相互作用,这可能共同导致在表面形成保护膜。

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