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Microstructure and Li alloy formation of nano-structured amorphous Si and Si/TiN composite thin film electrodes

机译:纳米结构非晶Si和Si / TiN复合薄膜电极的微观结构和Li合金的形成

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Nano-structured silicon-based thin films have been successfully fabricated in amorphous Si and Si/TiN nano-composite forms by pulsed laser deposition method. A direct comparison of the lithium alloying behavior with the microstructure of these two thin films was investigated by measuring the X-ray diffraction, transmission electron microscopy, selected area electron diffraction, X-ray photoelectron spectrometry and electrochemical galvanostatic cycling. The as-deposited Si and Si/TiN composite thin films fabricated at a laser fluence of 2 J/cm~2 were found to be amorphous. The amorphous Si/TiN nano-composite film used as negative electrode exhibited higher capacity and better capacity retention than that of amorphous Si film electrode, which could be attributed to the dispersed Si particles in the nanometer range, forming an amorphous structure of the composite film and the presence of an inactive matrix of TiN.
机译:纳米结构的硅基薄膜已经成功地通过脉冲激光沉积法制备了非晶硅和Si / TiN纳米复合材料形式。通过测量X射线衍射,透射电子显微镜,选择区域电子衍射,X射线光电子能谱和电化学恒电流循环,研究了锂合金化行为与这两个薄膜的微观结构的直接比较。发现以2J / cm〜2的激光通量制备的沉积的Si和Si / TiN复合薄膜是非晶的。与非晶硅膜电极相比,用作负极的非晶硅/ TiN纳米复合膜具有更高的容量和更好的容量保持性,这可以归因于纳米范围内分散的硅颗粒,从而形成了复合膜的非晶结构。以及TiN惰性矩阵的存在。

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