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High Activity and Stability of Pt2Bi Catalyst in Formic Acid Oxidation

机译:Pt2Bi催化剂在甲酸氧化中的高活性和稳定性

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Formic acid oxidation was studied on a new prepared Pt2Bi characterized by X-ray diffraction spectroscopy (phase composition), scanning tunneling microscopy (STM) (surface morphology), and CO_(ads) stripping voltam-metry (surface composition). Bulk composition of Pt2Bi revealed two phases-55% PtBi alloy and 45% Ft. Estimated contribution of pure Ft on the Ft2Bi surface (43.5%) determined by CO_(ads) stripping voltammetry corresponds closely to bulk composition. Ft2Bi reveals high activity and stability in formic acid oxidation. High activity originates from the fact that formic acid oxidation proceeds completely through dehydrogenation path based on an ensemble effect. The high stability of Ft2Bi surface is induced by the suppression of Bi leaching as it was evidenced by insignificant changes of surface morphology and surface roughness shown by STM images before and after electrochemical treatment in formic acid containing solution. Ft2Bi is found to be powerful catalyst exhibiting up to two orders of magnitude larger current densities at 0.0 V and onset potential shifted for ~0.2 V to more negative value relative to Ft under steady-state condition.
机译:在新制备的Pt2Bi上研究了甲酸的氧化,其特征在于X射线衍射光谱(相组成),扫描隧道显微镜(STM)(表面形态)和CO_(ads)溶出伏安法(表面组成)。 Pt2Bi的体相组成显示出两个相:55%PtBi合金和45%Ft。通过CO_(ads)溶出伏安法测定的Ft2Bi表面上纯Ft的估计贡献(43.5%)与本体组成密切相关。 Ft2Bi在甲酸氧化中显示出高活性和稳定性。高活性源自这样的事实,即基于整体效应,甲酸氧化完全通过脱氢途径进行。 Ft2Bi表面的高稳定性是由Bi浸出的抑制引起的,这是由含甲酸溶液中电化学处理前后STM图像显示的表面形态和表面粗糙度的微小变化所证明的。发现Ft2Bi是一种强大的催化剂,在0.0 V时表现出高达2个数量级的更大电流密度,并且在稳态条件下,相对于Ft,起始电势偏移〜0.2 V至更大的负值。

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