Wetting properties of nanostructured ZnxFeyO4 thin films deposited by a soft solution process

摘要

ZnxFeyO4 thin films were deposited by a light-enhanced soft-solution deposition process. A deposition rate of 0.13-0.15 mu m/min was achieved. This deposition rate is sufficiently high for growing thick films that are needed for microwave applications. Scanning electron microscope and transmission electron microscopy images of deposited films show a platelike morphology with a fibrous texture. The contact angle measurements indicate that the wetting behavior of nanostructured ZnxFeyO4 thin films changes from hydrophobic to hydrophilic with increasing film thickness. This observation is attributed to the films' surface roughness based on the surface profiling data.