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首页> 外文期刊>Electrochemical and solid-state letters >Effects of Ni substitution on structural, dielectrical, and ferroelectric properties of chemical-solution-deposited multiferroic BiFeO3 films
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Effects of Ni substitution on structural, dielectrical, and ferroelectric properties of chemical-solution-deposited multiferroic BiFeO3 films

机译:镍取代对化学溶液沉积的多铁性BiFeO3薄膜的结构,介电和铁电性能的影响

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摘要

Multiferroic thin films of Ni-substituted BiFeO3 were grown by chemical-solution deposition on Pt/Ti/SiOx/Si(100) substrates. Films with up to 7.5 atom % Ni substitution showed a single perovskite phase with rhombohedral structure at room temperature, while films with 10 atom % Ni substitution showed a tetragonal-like crystal structure. Ni substitution of 2.5 atom % was effective in suppressing leakage current in the high-electric-field region with high polarization (72 mu C/cm(2)) and coercive field (340 kV/cm) when polarization vs electric field hysteresis loops were drawn at 20 kHz with a maximum electric field of 1100 kV/cm.
机译:通过在Pt / Ti / SiOx / Si(100)衬底上进行化学溶液沉积来生长Ni-取代的BiFeO3的多铁性薄膜。 Ni取代度最高为7.5%的薄膜在室温下显示具有菱形结构的单个钙钛矿相,而Ni取代度为10原子%的薄膜则显示出四方晶的晶体结构。当极化极化与电场磁滞回线为时,Ni原子取代2.5个原子%可有效抑制高极化(72μC / cm(2))和矫顽场(340 kV / cm)的高电场区域的泄漏电流以20 kHz的频率绘制,最大电场为1100 kV / cm。

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