Dynamic Lateral Force Measurements during Chemical Mechanical Polishing of Silica

摘要

Lateral frictional force measurement provides anunderstanding of pad-surface interactions in chemical mechanicalpolishing. The lateral forces have been found to be significantlydependent on the surface roughness of the silica, thus showingthat in situ dynamic changes in the surface roughness could beobserved. Studies of the effect of pH and ionic strength onpolishing characteristics of silica are presented. The studies wereconducted with particle-free slurries, so as to obtain a bettersignal-to-noise ratio. The rate of material removal as a functionof pH and ionic strength was determined and correlated with thefriction force measurements.