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Porosity and Tellurium-Enrichment of Anodized p-Cd0.95Zn0.05Te

机译:阳极氧化p-Cd0.95Zn0.05Te的孔隙率和碲富集

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In contrast to several other p-type compoundsemiconductors, p-Cd0.95Zn0.05Te becomes porous by anodictreatment in acidic solution. Porous layers more than 100μmthick can be obtained by prolonged anodization in 0.5 M H2SO4.Coulometry and chemical analysis by X-ray photoelectronspectroscopy indicate that the pore walls are covered by a film ofelemental tellurium, and the presence of this passivating film maypartly explain why anodic etching of the p-type material yields aporous morphology. The porosity, the tellurium-enrichment, andtheir effects on the photoelectrochemical properties are discussedand compared to reports for other semiconductor materials.
机译:与其他几种p型化合物半导体相反,p-Cd0.95Zn0.05Te在酸性溶液中通过阳极处理变得多孔。在0.5 M H2SO4中长时间进行阳极氧化可得到厚度超过100μm的多孔层。库仑法和X射线光电子能谱法化学分析表明,孔壁被元素碲膜覆盖,并且该钝化膜的存在可能部分解释了为什么进行阳极蚀刻p型材料的混合物产生多孔形态。讨论了孔隙率,碲富集及其对光电化学性能的影响,并将其与其他半导体材料的报道进行了比较。

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