Integrating sub-wavelength tools into the design flow

摘要

Recently a number of new specialist photolithographic optical techniques have been developed, such as phase-shift correction and Optical Proximity Correction (OPC). These have been in response to the need to produce silicon system-on-a-chip(S-o-C) designs with sub-wavelength device features, that offer the required higher performance and use lower power. While the techniques have been proven, the industry must now deal with the problem of integrating them into a normal design flow. This feature looks at the state of the art.