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首页> 外文期刊>ECS Solid State Letters >Improved Surface Passivation Using Dual-Layered a-Si:H for Silicon Heterojunction Solar Cells
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Improved Surface Passivation Using Dual-Layered a-Si:H for Silicon Heterojunction Solar Cells

机译:使用双层a-Si:H改进的硅异质结太阳能电池的表面钝化

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Silicon heterojunction solar cells require high quality surface passivation to enhance the device performance. In this study, dual-layered hydrogenated amorphous silicon (a-Si:H) deposited at different hydrogen dilution is investigated for the improvement of surface passivation. Dual-layered a-Si:H is functionalized as smooth interfacial and dense capping layers. As-deposited dual-layered passivation shows 33.4% enhancement of the minority carrier lifetime from quasi-steady-state photo-conductance measurements up to 197.6 μs comparing to 148.1 μs of single-layered a-Si:H at 10~(15) cm~(-3) injection level. The improved effective lifetime and implied open circuit voltage of dual-layered passivation are 401.5 μs and 712 mV with post-annealing process.
机译:硅异质结太阳能电池需要高质量的表面钝化来增强器件性能。在这项研究中,研究了在不同氢稀释下沉积的双层氢化非晶硅(a-Si:H),以改善表面钝化。双层a-Si:H被功能化为光滑的界面层和致密的覆盖层。沉积的双层钝化显示准载态光电导测量(直到197.6μs)的少数载流子寿命提高了33.4%,而10〜(15)cm处的单层a-Si:H则为148.1μs 〜(-3)注射水平。经过后退火处理后,双层钝化层的有效寿命和隐含的开路电压提高了401.5μs和712 mV。

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