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Electrical, Optical and Structural Properties of SnO2:Sb:F Thin Films Deposited from Sn(acac)(2) by Spray Pyrolysis

机译:喷雾热解法从Sn(acac)(2)沉积SnO2:Sb:F薄膜的电,光学和结构性质

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摘要

In this work, Fluorine + Antimony doped Tin oxide thin films (SnO2:Sb + F), were deposited on heated glass substrates using the ultrasonic spray pyrolysis technique. Tin(IV)-bis(acetylacetonate) dichloride ((C5H8O2)(2)SnCl2), was used as source of Tin. The use of the latter reagent was considered important, since its usage had scarcely been reported. Antimony chloride (SbCl3) and Ammonium fluoride (NH4F) were used as sources of the dopants of Antimony and Fluorine, respectively. The properties of the films resulted dependent on the relative amount of these dopants. The films as deposited were polycrystalline, with a low roughness, and showed excellent optical transparency, close to 90%, in the visible region of the electromagnetic spectrum. Fluorine in the films was only detected by Secondary Ion Mass Spectroscopy (SIMS) measurements, and films deposited with 5% of NH4F and 5% of SbCl3 in solution, showed the best electrical properties. An electronic conductivity up to 400 S/cm, and mobility, close to 10 cm(2)/V sec, were found in the best SnO2 film. An ionized impurity scattering mechanism seems to be responsible for the electronic transport in these films. In addition, the electronic conduction by bulk (or grains), was verified by impedance spectroscopy. (c) 2016 The Electrochemical Society. All rights reserved.
机译:在这项工作中,使用超声喷涂热解技术将氟+锑掺杂的氧化锡薄膜(SnO2:Sb + F)沉积在加热的玻璃基板上。锡(IV)-双(乙酰丙酮)二氯化锡((C5H8O2)(2)SnCl2)被用作锡的来源。后一种试剂的使用被认为是重要的,因为几乎没有报道其用法。氯化锑(SbCl3)和氟化铵(NH4F)分别用作锑和氟的掺杂源。薄膜的性质取决于这些掺杂剂的相对量。所沉积的膜是多晶的,具有低粗糙度,并且在电磁光谱的可见光区域中显示出优异的光学透明性,接近90%。薄膜中的氟仅通过二次离子质谱法(SIMS)进行检测,并且沉积有5%NH4F和5%SbCl3溶液的薄膜显示出最佳的电性能。在最好的SnO2薄膜中发现了高达400 S / cm的电子电导率和接近10 cm(2)/ V sec的迁移率。离子化的杂质散射机制似乎是这些薄膜中电子传输的原因。另外,通过阻抗谱法证实了通过块状(或颗粒状)的电子传导。 (c)2016年电化学学会。版权所有。

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