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首页> 外文期刊>Journal of engineering for gas turbines and power: Transactions of the ASME >Diffusion bonding of CMSX-4 to UDIMET 720 using PVD-coated interfaces and HIP
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Diffusion bonding of CMSX-4 to UDIMET 720 using PVD-coated interfaces and HIP

机译:使用 PVD 涂层界面和 HIP 将 CMSX-4 与 UDIMET 720 进行扩散粘合

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There is an increasing interest in development of manufacturing methods for Dual Property BLISKs, consisting of creep resistant airfoils and fatigue resistant disks bonded together by a durable joint. Optimum heat treatments are, however; verydifferent for creep resistant single crystal CMSX-4 and fatigue resistant polycrystalline Udimet 720 selected in this study, but fortunately the first aging treatment for CMSX-4 (1140℃, 2-6 h, AC) is similar to the partial solution treatment of U 720 HS2 (115℃, 4 h, OQ). Based on this, diffusion bonding was peiformed by HIP at 1120℃ and 200 MPa argon pressure for 4 h, followed by cooling to 400℃. Subsequently, a shortened Udimet 720 HS2 two-step aging treatment was adopted by heating to 650℃ for 6 hfollowed by cooling to 400℃, heating to 760℃ for 2 h, and finally cooling to R.T. under remaining HIP pressure. Plasma etching followed by thin (80 nm) PVD coating with either nickel or titanium were used to clean and protect the polished surfacesbefore joining. The selection of coatings was governed by the possibility to reduce oxidized nickel by flushing with hydrogen at 330℃ during evacuation of the HIP capsules, and by the large solubility of oxygen in titanium. Hot tensile testing wasperformed at 750℃ on both joined and reference materials subjected to the modified heat treatment. Initially solution treated Udimet 720 and CMSX-4 comprised the reference materials. The testing showed that joints with Ni-PVD coatings were almost asstrong as Udimet 720 (although with very limited elongation), while the joints with Ti-PVD coatings were weaker.
机译:人们对开发双特性 BLISK 的制造方法越来越感兴趣,该方法由抗蠕变翼型和通过耐用接头粘合在一起的抗疲劳圆盘组成。然而,最佳的热处理是;本研究选择的抗蠕变单晶CMSX-4和抗疲劳多晶Udimet 720差异很大,但幸运的是,CMSX-4(1140°C,2-6 h,AC)的第一次老化处理与U 720 HS2(115°C,4 h,OQ)的部分固溶处理相似。在此基础上,采用HIP在1120°C和200 MPa氩气压力下进行扩散键合4 h,然后冷却至400°C。随后,采用缩短的Udimet 720 HS2两步老化处理,加热至650°C6 h,冷却至400°C,加热至760°C2 h,最后在剩余HIP压力下冷却至R.T.。等离子体蚀刻,然后用镍或钛进行薄 (80 nm) PVD 涂层,在连接前清洁和保护抛光表面。涂层的选择取决于在抽真空 HIP 胶囊期间通过在 330°C 下用氢气冲洗来还原氧化镍的可能性,以及氧在钛中的大溶解度。在750°C下对经过改性热处理的连接材料和参考材料进行热拉伸试验。最初溶液处理的 Udimet 720 和 CMSX-4 构成了参考材料。测试表明,带有Ni-PVD涂层的接头几乎与Udimet 720一样坚固(尽管伸长率非常有限),而带有Ti-PVD涂层的接头则较弱。

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