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Structural studies of tin-doped indium oxide (ITO) and In4Sn3O12

机译:掺杂锡的氧化铟(ITO)和In4Sn3O12的结构研究

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Structural changes in the indium oxide lattice due to doping with Sn4+ (ITO) were studied by Mossbauer spectroscopy, EXAFS, and neutron powder diffraction, There is a decrease in electrical conductivity as the tin content and oxygen partial pressure increase, which is related to a distortion in the first Sn-O shell, Doping with tin increases the oxygen/cation ratio and the lattice parameter and decreases the Sn-O distances, which disorders the host network, The low-conduction In4Sn3O12 phase precipitates when the tin content exceeds 6 at.%, In4Sn3O12 is rhombohedral (space group R (3) over bar, a = 9.4604(2) Angstrom, and c = 8.8584(2) Angstrom in a hexagonal basis), There is a cation ordering with octahedral sites fully occupied by tin, the tin sites being equivalent in both highly doped ITO and In4Sn3O12. (C) 1998 Academic Press. [References: 33]
机译:通过Mossbauer光谱,EXAFS和中子粉末衍射研究了由于掺入Sn4 +(ITO)而引起的氧化铟晶格的结构变化,随着锡含量和氧分压的增加,电导率降低,这与在第一个Sn-O壳中发生形变,掺杂锡会增加氧/阳离子比率和晶格参数并减小Sn-O距离,这会扰乱宿主网络。当锡含量超过6时,低导电In4Sn3O12相析出。%,In4Sn3O12是菱形(空间组R(3)超过bar,a = 9.4604(2)埃,c = 8.8584(2)埃,以六边形计),存在一个阳离子顺序,其八面体位点被锡完全占据在高掺杂的ITO和In4Sn3O12中,锡的位置相同。 (C)1998年学术出版社。 [参考:33]

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