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Fabrication and photoelectrochemical properties of porous ZnWO4 film

机译:ZnWO4多孔膜的制备及光电化学性能

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Porous ZnWO4 films have been fabricated on Indium-tin oxide (ITO) glass and its photoelectrochemical properties and high photocatalytic activities towards degradation of rhodamine B (RhB) has been investigated. Using amorphous heteronuclear complex as precursor and with the addition of polyethylene glycol (PEG, molecular weight = 400), the porous ZnWO4 films have been achieved at the temperature of 500 degrees C via dip-coating method. It is composed of approximately 70 nm-sized particles and exhibits substantial porosity. The textures and porosity of ZnWO4 films are dependent on preparation factors, such as the ratio of precursor/PEG and the annealing conditions. The formation mechanism of porous ZnWO4 films was proposed. The porous ZnWO4 films exhibited high photocatalytic activities towards degrading RhB. The top of valence band and the bottom of the conduction band was estimated to be -0.56 and 3.45 eV (vs. saturated calomel electrode (SCE)), respectively. (c) 2006 Elsevier Inc. All rights reserved.
机译:在铟锡氧化物(ITO)玻璃上制备了多孔ZnWO4膜,并研究了其光电化学性质和对罗丹明B(RhB)降解的高光催化活性。使用无定形异核配合物作为前体,并添加聚乙二醇(PEG,分子量= 400),通过浸涂法在500摄氏度的温度下获得了多孔ZnWO4薄膜。它由大约70 nm大小的颗粒组成,并具有明显的孔隙率。 ZnWO4薄膜的织构和孔隙率取决于制备因素,例如前体/ PEG的比例和退火条件。提出了多孔ZnWO4薄膜的形成机理。多孔ZnWO4薄膜对降解RhB具有高的光催化活性。价带的顶部和导带的底部分别估计为-0.56和3.45 eV(相对于饱和甘汞电极(SCE))。 (c)2006 Elsevier Inc.保留所有权利。

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