Nanopit generation on HOPG surface induced by CAFM electric lithography

摘要

Nanopits in the diameter of sub-hundred and hundreds of nanometres were generated under different voltage magnitudes by conductive atomic force microscope (CAFM) electric lithography method in ambient environment. The pit lithography was conducted through applying conductive probe to measure the I-V curve during AFM contact state. The pit patterns were generated at the position beneath the tip along the I-V curve measurement process. By comparing the geometry sizes of the formed nanopits and their process current evolution under different bias voltages, the nano-machining phenomenon of CAFM electric point lithography was studied and the nanoscale electrical breakdown was suggested as the possible mechanism besides the local anodic oxidation in the high voltage range.