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首页> 外文期刊>International Journal of Robotics & Automation >A unified control approach for an electron beam physical vapour deposition process
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A unified control approach for an electron beam physical vapour deposition process

机译:电子束物理气相沉积过程的统一控制方法

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This paper presents a unified approach for the automatic control of an electron beam physical vapour deposition (EBPVD) process. Images of the melt pool are analyzed on a block-by-block basis and a technique to identify critical regions of the melt pool, as would be designated by trained operators, is given. Simulation results demonstrate the feasibility of automating the electron beam steering sequence. In addition, methods to obtain input data describing the melt pool and the incorporation of this data into an overall control strategy that would insure the uniformity of coatings are presented.
机译:本文提出了一种用于电子束物理气相沉积(EBPVD)过程自动控制的统一方法。对熔池的图像进行逐块分析,并给出了一种确定熔池关键区域的技术,该技术将由受过培训的操作员指定。仿真结果证明了自动进行电子束控制序列的可行性。另外,提出了获得描述熔池的输入数据以及将该数据合并到可确保涂层均匀性的总体控制策略中的方法。

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