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Current density in a model of a human body with a conductive implant exposed to ELF electric and magnetic fields

机译:具有人体植入物的人体模型中的电流密度暴露于ELF电场和磁场

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摘要

A numerical model of a human body with an intramedullary nail in the femur was built to evaluate the effects of the implant on the current density distribution in extremely low frequency electric and magnetic fields. The intramedullary nail was chosen because it is one of the longest high conductive implants used in the human body. As such it is expected to alter the electric and magnetic fields significantly. The exposure was a simultaneous combination of inferior to superior electric field and posterior to anterior magnetic field both alternating at 50 Hz with the values corresponding to the ICNIRP reference levels: 5000 V m -1 for electric field and 100 μT for magnetic flux density. The calculated current density distribution inside the model was compared to the ICNIRP basic restrictions for general public (2 mA m -2). The results show that the implant significantly increases the current density up to 9.5 mA m -2 in the region where it is in contact with soft tissue in the model with the implant in comparison to 0.9 mA m -2 in the model without the implant. As demonstrated the ICNIRP basic restrictions are exceeded in a limited volume of the tissue in spite of the compliance with the ICNIRP reference levels for general public, meaning that the existing safety limits do not necessarily protect implanted persons to the same extent as they protect people without implants.
机译:建立了在股骨中带有髓内钉的人体数值模型,以评估植入物对极低频电场和磁场中电流密度分布的影响。选择髓内钉是因为它是人体中使用时间最长的高导电植入物之一。因此,期望显着改变电场和磁场。曝光是同时发生的下磁场和上磁场以及后磁场到后磁场的组合,两者交替以50 Hz交替变化,其值对应于ICNIRP参考水平:电场为5000 V m -1,磁通密度为100μT。将模型内计算出的电流密度分布与ICNIRP公众的基本限制(2 mA m -2)进行比较。结果表明,与没有植入物的模型中的0.9 mA m -2相比,植入物在具有植入物的模型中与软组织接触的区域中的电流密度显着提高至9.5 mA m -2。正如已证明的那样,尽管符合ICNIRP参考水平,但在有限的组织体积中仍超出了ICNIRP基本限制,这意味着现有的安全限制并不一定能像不保护植入的人一样保护植入的人。植入物。

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