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Effect of molar concentration of CuCl2 on the characteristics of Cu2S film

机译:CuCl2摩尔浓度对Cu2S薄膜特性的影响

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In this work, the influence of molar concentration of CuCl2 on copper sulfide Cu2S film synthesized by chemical bath deposition and on the performance of p-Cu2S/p-Si heterojunction photodetector was studied. The effect of copper chloride concentration on the structural, optical properties and electrical properties of Cu2S film was investigated. The optical studies show that the optical energy gap varied from 2.68 to 2.8 eV as the concentration varied from 0.06 to 0.15 M. X-ray diffraction XRD results confirm that the deposition films having of monoclinic chalcocite phase. Scanning electron microscope SEM investigation illustrate the formation of nanostructured Cu2S film with particle size ranged from 50 to80 nm depending on the copper chloride concentration. Two Raman peaks were observed located at 265 and 470 cm(-1) assigned to the Cu-S bond vibration and vibrational stretching mode, respectively. The mobility of charge carriers in the film and the electrical conductivity of the film were investigated as a function of copper chloride concentration. Dark and illuminated I-V characteristics of p-Cu2S/p-Si heterojunction HJ photodetectors were measured at room temperature. The best rectification was for heterojunction prepared at 0.13 M CuCl2. The maximum responsivity of the photodetector was about 0.67A/W at 450 nm for photodetector prepared at 0.13 M.
机译:本文研究了CuCl2摩尔浓度对化学浴沉积法合成的硫化铜Cu2S薄膜及对p-Cu2S/p-Si异质结光电探测器性能的影响。研究了氯化铜浓度对Cu2S薄膜结构、光学性能和电学性能的影响。光学研究表明,当浓度在0.06-0.15 M之间变化时,光能隙在2.68-2.8 eV之间变化。 X射线衍射XRD结果证实,该沉积膜具有单斜辉铜矿相。扫描电子显微镜 SEM 研究表明,根据氯化铜浓度的不同,纳米结构 Cu2S 薄膜的粒径范围为 50 至 80 nm。在265 cm和470 cm(-1)处观察到两个拉曼峰,分别归因于Cu-S键振动和振动拉伸模式。研究了薄膜中电荷载流子的迁移率和薄膜的电导率与氯化铜浓度的关系。在室温下测量了p-Cu2S/p-Si异质结HJ光电探测器的暗和光I-V特性。在0.13 M CuCl2下制备的异质结是最佳的精馏方法。对于在0.13 M处制备的光电探测器,光电探测器在450 nm处的最大响应度约为0.67A/W。

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