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首页> 外文期刊>International Journal of Modern Physics, B. Condensed Matter Physics, Statistical Physics, Applied Physics >The influence of quaternary electron blocking layer on the performance characteristics of intracavity-contacted oxide-confined InGaN-based vertical cavity surface emitting lasers
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The influence of quaternary electron blocking layer on the performance characteristics of intracavity-contacted oxide-confined InGaN-based vertical cavity surface emitting lasers

机译:四元电子阻挡层对腔内接触氧化物限制的InGaN基垂直腔面发射激光器性能特性的影响

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摘要

The effect of electron blocking layer (EBL) on the performance characteristics of InGaN-based vertical cavity surface emitting lasers (VCSELs) was numerically investigated using an integrated system engineering technical computer aided design (ISE TCAD) simulation program. Simulation results indicated that the performance characteristics of InGaN quantum well VCSEL were improved by the ternary Al0.17Ga0.83N EBL. Better performance was also obtained when Al0.17Ga0.83N EBL was replaced by a polarization-matched Al0.275In0.115Ga0.61N EBL having the same energy bandgap. The quaternary EBL enhances the output power and differential quantum efficiency (DQE) as well as reduces the threshold current compared with the ternary EBL. Enhancement in the value of the optical intensity was also observed in the VCSEL structure with quaternary EBL. Furthermore, the effect of Al composition of AlInGaN EBL on the performance of InGaN-based VCSEL structure that uses the quaternary AlInGaN EBL was studied. In mole fraction was 0.115, Al mole fraction changed from 0.260 to 0.290 by step 0.005, and optimum performance was achieved in 0.275 Al mole fraction of AlInGaN EBL.
机译:使用集成的系统工程技术计算机辅助设计(ISE TCAD)仿真程序,对电子阻挡层(EBL)对基于InGaN的垂直腔表面发射激光器(VCSEL)的性能特征的影响进行了数值研究。仿真结果表明,三元Al0.17Ga0.83N EBL改善了InGaN量子阱VCSEL的性能。当用具有相同能带隙的极化匹配的Al0.275In0.115Ga0.61N EBL代替Al0.17Ga0.83N EBL时,也可以获得更好的性能。与三元EBL相比,四元EBL增强了输出功率和差分量子效率(DQE),并降低了阈值电流。在具有四级EBL的VCSEL结构中,还观察到了光强度值的增强。此外,研究了AlInGaN EBL的Al组成对使用四元AlInGaN EBL的基于InGaN的VCSEL结构的性能的影响。摩尔分数为0.115,通过步骤0.005,Al摩尔分数从0.260变为0.290,并且在0.275Al摩尔分数的AlInGaN EBL中实现了最佳性能。

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