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首页> 外文期刊>International Journal of Nanotechnology >Controlling stability and electronic properties of small-diameter SiC nanowires by fluorination
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Controlling stability and electronic properties of small-diameter SiC nanowires by fluorination

机译:通过氟化控制小直径SiC纳米线的稳定性和电子性能

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摘要

We report results of a density functional theory study of the electronic properties and stability of fluorine-saturated 0.355nm-thick silicon carbide nanowires with a 3C-SiC core and grown along the [111] direction. The electronic band gaps of the fully fluorinated SiC nanowires are lower than that of the corresponding fully hydrogenated ones by up to 1.09 eV. Moreover, the structural stability is found to increase linearly with fluorine surface covering. For mixed fluorination and hydrogenation surface decoration schemes, the band gaps usually lie between the values of the fully fluorinated and the corresponding fully hydrogenated nanowire. Furthermore, the band gap type changes from direct to indirect for fluorine coverings exceeding 16.66%. These results indicate that fluorination of the nanowire surface may be used to control the stability as well as the size and nature of the band gap.
机译:我们报告了密度泛函理论研究的结果,该结果具有3C-SiC核并沿[111]方向生长,含氟饱和的0.355nm厚的碳化硅纳米线的电子性能和稳定性。完全氟化的SiC纳米线的电子带隙比相应的完全氢化的SiC纳米线的电子带隙低至1.09 eV。此外,发现结构稳定性随氟表面覆盖物线性增加。对于混合氟化和氢化表面装饰方案,带隙通常位于完全氟化的纳米线和相应的完全氢化的纳米线的值之间。此外,对于超过16.66%的氟覆盖物,带隙类型从直接改变为间接。这些结果表明,纳米线表面的氟化可用于控制稳定性以及带隙的大小和性质。

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