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NOVEL HIGH TEMPERATURE ANNEALED SCHOTTKY METAL FOR GaN DEVICES

机译:用于GaN设备的新型高温退火肖特基金属

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摘要

We have found that Scandium metal is near ohmic as deposited on GaN, but when it is annealed at high temperatures a large barrier height Schottky forms. In this study we used Sc-Au contacts to form Schottky barrier diodes on AlGaN/GaN HEMT material. We have found that the morphology remains unchanged even after an 800 degrees centigrade anneal. This investigation has revealed that the reverse leakage current of this metal system is an order of magnitude lower than a conventional Ni-Au contact and supports a reverse breakdown that is 1/3rd larger. The similarity of the anneal temperatures to ohmic contacts enable gates and contacts to be annealed at the same time thus simplifying processing. The lack of morphology change supports the use of Sc-Au for E-beam alignment marks as well. Diode contacts on AlGaN/GaN with Schottky-ohmic separation of 10 microns demonstrated reverse breakdown in excess of 100V when the contacts were annealed at 800C. These results suggest this metallization may have applications as a new HEMT gate metal, and Schottky diodes.
机译:我们已经发现,Scan金属在GaN上沉积时接近于欧姆,但是​​在高温下退火时,会形成较大的势垒高度肖特基。在这项研究中,我们使用Sc-Au触点在AlGaN / GaN HEMT材料上形成肖特基势垒二极管。我们已经发现,即使在800摄氏度的退火温度下,其形态仍保持不变。这项研究表明,该金属系统的反向泄漏电流比常规的Ni-Au触点低一个数量级,并且支持的反向击穿电流大1/3。退火温度与欧姆接触的相似性使栅极和接触可以同时退火,从而简化了工艺。缺乏形态学变化也支持将Sc-Au用于电子束对准标记。当肖特基欧姆间隔为10微米时,AlGaN / GaN上的二极管触点在800℃退火时表现出超过100V的反向击穿。这些结果表明,这种金属化可作为新的HEMT栅极金属和肖特基二极管得到应用。

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