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首页> 外文期刊>Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films >Preparation of transparent p-type (La1-xSrxO)CuS thin films by r.f. sputtering technique
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Preparation of transparent p-type (La1-xSrxO)CuS thin films by r.f. sputtering technique

机译:射频溅射技术制备透明p型(La1-xSrxO)CuS薄膜

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摘要

Single phase thin films of a layered oxysulfide, (La1-xSrxO)CuS (x = 0, and 0.03), were prepared by r.f. sputtering technique followed by a post-annealing treatment in an evacuated silica tube containing a small amount of (LaO)CuS powder. Key growth parameters for obtaining a single-phase film were the r.f. power and the substrate temperature in r.f. sputtering under an H,S atmosphere. ICP and FP-XRF measurements revealed that the chemical compositions of post-annealed films prepared under optimum conditions were in significant agreement with those of the target. Sr2+ ion doping in the films was performed by adding SrS in the targets, which enhanced the p-type electrical conductivity from 6.4x10(-5) (x=0) to 20 S cm(-1) (x=0.03). Optical transmission spectra of the films showed high optical transmission (>60) in the visible-near IR region. (C) 2002 Elsevier Science B.V. All rights reserved. References: 12
机译:采用射频溅射技术制备了层状硫化物(La1-xSrxO)CuS(x = 0和0.03)的单相薄膜,然后在含有少量(LaO)CuS粉末的真空二氧化硅管中进行退火后处理。获得单相薄膜的关键生长参数是H,S气氛下射频溅射的射频功率和衬底温度。ICP和FP-XRF测量表明,在最佳条件下制备的后退火薄膜的化学成分与目标的化学成分显著一致。通过在靶材中加入SrS,对薄膜中的Sr2+离子进行掺杂,使p型电导率从6.4x10(-5)(x=0)提高到20 S cm(-1)(x=0.03)。薄膜的透射光谱在可见光-近红外区域显示出高透射率(>60%)。(C) 2002 Elsevier Science B.V.保留所有权利。[参考文献: 12]

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