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p-Type oxides for use in transparent diodes

机译:用于透明二极管的p型氧化物

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Several p-type oxides of the delafossite structure have been investigated in the hope that the conductivity and transparency will be high enough to render them useful in the manufacture of transparent p-n junction diodes and other transparent devices. The highest conductivity achieved to date has been 220 S/cm in CuCr1-xMgxO2 thin films. Oxygen intercalation in CuSc1-xMgxO2+y films improves the conductivity at the expense of optical transparency. We have improved the conductivity of CuGaO2-based films from 0.02 to 1 S/cm, by substitution of Fe for Ga. p-Type conductivity has been demonstrated in an Ag-based delafossite film. A sputter-deposited AgCoO2 film has a conductivity of 0.2 S/cm, a Seebeck coefficient of 230 muV/K and a band gap of 4.1 eV at room temperature. CuNi2/3Sb1/3O2 films have been produced that are p-type conductors when doped with Sn. (C) 2002 Elsevier Science B.V. All rights reserved. References: 23
机译:已经研究了几种 delafossite 结构的 p 型氧化物,希望电导率和透明度足够高,使它们可用于制造透明的 p-n 结二极管和其他透明器件。迄今为止,在CuCr1-xMgxO2薄膜中达到的最高电导率为220 S/cm。CuSc1-xMgxO2+y薄膜中的氧嵌入以牺牲光学透明度为代价提高了电导率。我们通过用Fe代替Ga将CuGaO2基薄膜的电导率从0.02提高到1 S/cm。溅射沉积的AgCoO2薄膜在室温下的电导率为0.2 S/cm,塞贝克系数为230 muV/K,带隙为4.1 eV。CuNi2/3Sb1/3O2薄膜在掺杂Sn时是p型导体。 (C) 2002 Elsevier Science B.V.保留所有权利。[参考文献: 23]

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