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Phase and microstructural evolution of Ir-Si binary alloys with fcc/silicide structure

机译:具有fcc /硅化物结构的Ir-Si二元合金的相和组织演变

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To search hardening approach or new probable phases benefiting to high temperature behavior of Ir-based superalloys, Ir alloyed with Si was employed. Investigations on phase and microstructural evolution of a series of Ir-xSi (x = 2.5, 5, 15, 20, 30, 36 and 45 mol percent ) binary alloys were carried out by XRD, EPMA and SEM analysis. A schematic plot of the Ir-Si binary diagram with the nominal Si content ranging from 0 to 50 mol percent was primarily drafted. Room temperature mechanical properties, the Vicker hardness and Young's modulus, of bulk material or each kind of phases were also measured. Researches reveal that with Si addition up to 50 mol percent, the microstructures are respectively composed of primary Ir solid solution fcc + peritectic Ir_3Si silicide (nominal Si content: 0-25 mol percent), primary Ir_3Si + eutectoid silicide (Si: 25-33.3 mol percent ), Ir_3Si_2 + eutectoid silicide (Si: 33.3-40 mol percent ) and primary IrSi + Ir_3Si_2 silicide (Si: 40-50 mol percent ). With plastic characteristic, the fcc phase has the low Vickers hardness and Young's modulus, while both of the silicides are high and the silicides behave brittle. For the high temperature applications over 1400 deg C, Ir-based alloys with Si dropping must avoid the appearance of any kind of Ir/Si silicides in microstructure because the melting points of silicides (Ir_3Si, Ir_2Si and Ir_3Si_2) are close to 1400 deg C; instead, solid solution hardening on Ir by Si is recommended.
机译:为了搜索硬化方法或有益于Ir基高温合金高温行为的新的可能相,采用了与Si合金化的Ir。通过XRD,EPMA和SEM分析研究了一系列Ir-xSi(x = 2.5、5、15、20、30、36和45 mol%)的Ir-xSi二元合金的相结构和微观组织演变。最初绘制了名义Si含量为0至50 mol%的Ir-Si二元图的示意图。还测量了散装材料或每种相的室温机械性能,维氏硬度和杨氏模量。研究表明,当硅的添加量最高为50 mol%时,显微组织分别由主要的Ir固溶体fcc +包晶的Ir_3Si硅化物(名义Si含量:0-25 mol%),主要的Ir_3Si +共析硅化物(Si:25-33.3)组成),Ir_3Si_2 +共析硅化物(Si:33.3-40 mol%)和伯IrSi + Ir_3Si_2硅化物(Si:40-50 mol%)。具有塑性特征的fcc相具有较低的维氏硬度和杨氏模量,而两种硅化物均较高,并且硅化物的行为较脆。对于超过1400℃的高温应用,带有Si滴落的Ir基合金必须避免在微观结构中出现任何种类的Ir / Si硅化物,因为硅化物(Ir_3Si,Ir_2Si和Ir_3Si_2)的熔点接近1400℃ ;取而代之的是,建议使用Si对Ir进行固溶硬化。

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