Nanostructuring Using 3D Deposition Lithography

摘要

The structuring of materials down to nanometers (one millionth of a millimeter) will be crucial to the development of technologies in the 21st century. Ever smaller structural sizes are required to improve the performance of electronic components. One of the major issues in nanotechnology is mass production. Nanostructuring with lithographic techniques is needed to implement the fabrication of large, cost-efficient nano-structures. As a result, calibration structures with object distances of less than 100 nm and EBID scanning tips with a height of 500 nm and a curvature radius of 7 nm at the tip were produced. Specially developed software for electron beam guidance in the VIDAS image processing software of H.W.P. Koops' research team was outstanding in that the exposure time for each pixel could be set individually, thus meeting a requirement of 3D EBID technology. 3D deposition lithography was used to carry out "rapid prototyping" of electronic and optical elements with sub-micrometer dimensions for the first time.