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A gas-discharge plasma source for the modification of the potential on the surface of an insulator

机译:气体放电等离子体源,用于改变绝缘子表面的电势

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摘要

A gas-discharge source of low-temperature plasma with the charged particle concentration of 10{sup}11 - 10{sup}13 m{sup}(-3) is described. The operating characteristics of the source are considered. Experiments showed that the developed plasma source can be effectively used for the soft (without breakdowns) neutralization of both surface and bulk excess charge accumulated by insulating materials.
机译:描述了带电粒子浓度为10 {sup} 11-10 {sup} 13m {sup}(-3)的低温等离子体的气体放电源。考虑光源的工作特性。实验表明,开发的等离子源可以有效地用于软化(无击穿)中和绝缘材料累积的表面和大量多余电荷的过程。

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