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Effect of molecular rarefaction on head/tape interface in a linear tape drive

机译:分子稀疏化对线性磁带机中磁头/磁带界面的影响

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Purpose - This paper aims to investigate analytically the air bearing pressure and film spacing of the linear head/tape interface by numerical iterations between the one-dimensional compressible Reynolds and Bernoulli tape equations. Design/methodology/approach - In order to account for the molecular rarefaction effect of the ultra-thin gas lubrication, the pressure flow rate with three optimal adjustable coefficients was implemented into the steady state Reynolds equation. Using the central finite difference approach, the two coupled nonlinear equations can be discretized and numerically solved. To speed up the convergence of the tape position to be obtained, a fictitious stiffness was implied during the process. Findings - By comparison with the Talke's first order model, the differences are significant and cannot be neglected. A smaller film spacing of head/tape can be acquired by a lower tape speed or a higher tape tension, while the slot edge defect and stain will effectively lower the built-up pressure, thus decreasing the recording density and data access efficiency. Originality/value - Incorporating the high-order slip-flow model into the modified Reynolds equation and coupled with the Bernoulli tape deflection equation, this study proposes a feasible approach to the analysis of molecular rarefaction effect on head/tape interface in a linear tape drive.
机译:目的-本文旨在通过一维可压缩雷诺兹和伯努利带方程之间的数值迭代来分析线性头/带界面的空气轴承压力和膜间距。设计/方法/方法-为了考虑到超薄气体润滑的分子稀疏效应,将具有三个最佳可调系数的压力流量实现到稳态雷诺方程中。使用中心有限差分法,可以将两个耦合的非线性方程离散化并通过数值求解。为了加快要获得的磁带位置的收敛速度,在此过程中暗含了虚拟的刚度。调查结果-与Talke的一阶模型相比,差异是明显的,不能忽略。较低的磁带速度或较高的磁带张力可以获得较小的磁头/磁带薄膜间距,而缝隙边缘的缺陷和污点将有效降低积聚压力,从而降低记录密度和数据访问效率。独创性/价值-将高阶滑流模型纳入经修改的Reynolds方程并结合Bernoulli胶带挠曲方程,本研究提出了一种分析线性磁带驱动器中磁头/磁带界面上的分子稀疏效应的可行方法。

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