...
首页> 外文期刊>Indian Journal of Pure & Applied Physics >Analysis of dielectric constants to determine sp(3)/sp(2) ratio and effect of substrate bias on spectroscopic ellipsometric studies of tetrahedral amorphous carbon films grown using an S bend filtered cathodic vacuum arc process
【24h】

Analysis of dielectric constants to determine sp(3)/sp(2) ratio and effect of substrate bias on spectroscopic ellipsometric studies of tetrahedral amorphous carbon films grown using an S bend filtered cathodic vacuum arc process

机译:介电常数分析,以确定sp(3)/ sp(2)的比值以及衬底偏压对使用S弯曲过滤阴极真空电弧法生长的四面体非晶碳膜的光谱椭偏研究的影响

获取原文
获取原文并翻译 | 示例
           

摘要

The carbon bonding ratio and optical properties have been studied by spectroscopic ellipsometry of as grown tetrahedral amorphous carbon (ta-C) films, deposited using in S bend filtered cathodic vacuum arc (FCVA) process. First, the carbon bonding ratio in ta-C films has been estimated from imaginary part of dielectric constant (epsilon(2)) spectra obtained by spectroscopy ellipsometry. A method has been developed to find out the fractions of sp(3) and sp(2) bonded carbon atoms from the Wemple-Didomenico plot. Second, the effect of varying negative substrate bias on the optical properties and sp(3)/sp(2) ratio of as-grown ta-C films has been made. The values of the optical constants evaluated are found to increase with the increase or the negative substrate bias in the as-grown ta-C films but the values of sp(3)/sp(2) ratio and the optical band gap (E-g) evaluated increase up to -200 V substrate bias and beyond -200 V substrate bias the values of sp(3)/sp(2) ratio and E-g decrease. Application of substrate bias is, thus, found to increase the sp(3) bonding and E-g up to -200V substrate bias and beyond -200V substrate bias there is reversal of the trend.
机译:通过使用S弯曲过滤阴极真空电弧(FCVA)工艺沉积的生长的四面体无定形碳(ta-C)薄膜,通过椭圆偏振光谱法研究了碳键合率和光学性能。首先,已从通过椭圆偏振光谱法获得的介电常数(ε(2))光谱的虚部估算了ta-C膜中的碳键合率。已经开发了一种从Wemple-Didomenico图中找出sp(3)和sp(2)结合的碳原子分数的方法。其次,已经做出了改变负衬底偏压对生长的ta-C膜的光学性能和sp(3)/ sp(2)比的影响。发现所生长的ta-C膜中评估的光学常数的值随衬底的增加或负衬底偏压的增加而增加,但是sp(3)/ sp(2)之比和光学带隙(Eg)的值经评估,增加到-200 V衬底偏置电压,超过-200 V衬底偏置电压,sp(3)/ sp(2)的比值和Eg减小。因此,发现施加衬底偏置可增加sp(3)键和E-g达到-200V衬底偏置,而超过-200V衬底偏置则存在趋势的逆转。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号