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Growth of semi-coherent Ni and NiO dual-phase nanoparticles using hollow cathode sputtering

机译:基于空心阴极溅射的半相干Ni和NiO双相纳米颗粒的生长

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摘要

Anisotropic heterogenous Ni/NiO nanoparticles with controlled compositions are grown using a high-power pulsed hollow cathode process. These novel particles can be tuned to consist of single-phase Ni via two-phase Ni/NiO to fully oxidized NiO, with a size range of 5-25 nm for individual crystals. A novelty of this approach is the ability to assemble multiple particles of Ni and NiO into a single complex structure, increasing the Ni-NiO interface density. This type of particle growth is not seen before and is explained to be due to the fact that the process operates in a single-step approach, where both Ni and O can arrive at the formed nanoparticle nuclei and aid in the continuous particle growth. The finished particle will then be a consequence of the initially formed crystal, as well as the arrival rate ratio of the two species. These particles hold great potential for applications in fields, such as electro- and photocatalysis, where the ability to control the level of oxidation and/or interface density is of great importance.
机译:使用高功率脉冲空心阴极工艺生长具有受控成分的各向异性异质 Ni/NiO 纳米颗粒。这些新型颗粒可以调整为由单相 Ni 通过两相 Ni/NiO 到完全氧化的 NiO 组成,单个晶体的尺寸范围为 5-25 nm。这种方法的新颖之处在于能够将多个Ni和NiO颗粒组装成一个复杂的结构,从而增加Ni-NiO界面密度。这种类型的颗粒生长以前从未见过,并被解释为由于该过程以单步方法运行,其中 Ni 和 O 都可以到达形成的纳米颗粒核并帮助连续的颗粒生长。然后,完成的颗粒将是最初形成的晶体以及两种物质的到达率比率的结果。这些颗粒在电催化和光催化等领域具有巨大的应用潜力,在这些领域中,控制氧化水平和/或界面密度的能力非常重要。

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