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Ray optics calculation of the radiation forces exerted on a dielectric sphere in an evanescent field

机译:e光场中施加在电介质球体上的辐射力的射线光学计算

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A ray optics approach was used to calculate the forces and the torque exerted on a dielectric sphere in the evanescent field produced by a linearly polarized Gaussian beam. The particle was assumed to be immersed in a dielectric fluid next to a solid dielectric plate with the evanescent field produced at the solid-fluid interface. Comparisons with calculations performed by use of more rigorous electromagnetic wave theory show that the ray optics results agree to within a factor of 2 even for particle radii as small as twice the incident wavelength. Calculation of the forces for conditions typical of a total internal reflection microscopy experiment show that the evanescent field has a negligible effect on either the net forces exerted on the particle or the particle motion (i.e., rotation or translation parallel to the interface). By our modifying the parameters of the experiment, however--namely, the incident beam power, radius of incident beam, and evanescent wave penetration depth--forces that are comparable with the net particle weight and capable of translating the particle several micrometers per second, as well as rotating the particle several revolutions per second, can be produced. The ability to micromanipulate a particle in this fashion could offer useful applications for studying particle and surface interactions.
机译:使用射线光学方法来计算线性偏振高斯光束产生的the逝场中施加在介电球体上的力和扭矩。假定该粒子被浸没在紧挨着固体电介质板的电介质流体中,在固体-流体界面处产生了the逝场。与使用更严格的电磁波理论进行的计算比较表明,即使对于小到入射波长两倍的粒子半径,射线光学结果也符合2的因数。对于全内反射显微镜实验典型条件的力的计算表明,e逝场对施加在粒子上的净力或粒子运动(即平行于界面的旋转或平移)的影响可忽略不计。但是,通过修改实验参数(即,入射光束的功率,入射光束的半径和penetration逝波的穿透深度),力可以与净粒子重量相当,并且能够每秒将粒子平移几微米以及每秒旋转粒子几圈都可以产生。以这种方式微操纵粒子的能力可以为研究粒子和表面相互作用提供有用的应用程序。

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