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Highly corrected submicrometer grid patterning on curved surfaces

机译:高度校正的亚微米网格图案在曲面上

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摘要

A compact holographic projector system was built and tested. This projection system offers a practical approach for making a highly corrected mesh or grid pattern on curved surfaces. The pattern can range in size from multimicrometer to submicrometer dimensions and be recorded in either positive or negative photoresist. Standing-wave interference patterns in the form of a diverging close-packed lattice of either hexagonal or square rodlike intensity maxima extending outward from a point or a locus of points are produced by multiple-beam holography that involves the combination of a holographic diffraction grating and a hypercomatic focusing objective.
机译:紧凑型全息投影仪系统已构建并经过测试。该投影系统提供了一种在弯曲表面上制作高度校正的网格或网格图案的实用方法。图案的尺寸范围可以从几微米到亚微米尺寸,并记录在正性或负性光致抗蚀剂中。通过多光束全息技术产生从点或点的位置向外延伸的六方或方棒状强度最大值的发散的紧密堆积的点阵形式的驻波干涉图,该多点全息涉及全息衍射光栅和过度聚焦的目标。

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