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ENHANCED BACKSCATTERING FROM A FREE-STANDING DIELECTRIC FILM

机译:独立的电介质膜增强了后向散射

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It has been known theoretically for a few years that not only a rough metallic surface but also a rough dielectric surface can produce an enhanced backscattering peak. Because of difficulty in the fabrication of one- or two-dimensional rough dielectric surfaces with a high index of refraction, no experiments to date have been able to reveal such a peak in scattering from a rough dielectric surface. We present experimental results showing enhanced backscattering from a free-standing dielectric film and compare them with the results of numerical simulations of such scattering. The vacuum-dielectric interface is a one-dimensional, randomly rough surface, and the dielectric-vacuum interface is approximately planar. The results of the numerical simulations of scattering from a one-dimensional, randomly rough free-standing dielectric film are in qualitative agreement with the experimental data, and it is believed that the main mechanism responsible for the enhanced backscattering peak is the reflection from the flat dielectric-vacuum interface. The coherent addition of a given light path that interacts with the rough dielectric surface at two different points because of its partial reflection from the back surface and its time-reversed partner leads to an enhancement of the intensity of scattering in the retroreflection direction with respect to the intensity of scattering in other directions. [References: 18]
机译:理论上已经知道了几年,不仅粗糙的金属表面而且粗糙的电介质表面都可以产生增强的反向散射峰。由于难以制造具有高折射率的一维或二维粗糙介电表面,因此迄今为止尚无实验能够揭示出从粗糙介电表面散射的这种峰值。我们目前的实验结果显示了自支撑电介质膜增强的反向散射,并将它们与这种散射的数值模拟结果进行了比较。真空-电介质界面是一维,随机粗糙的表面,而电介质-真空界面大致是平面的。一维,随机粗糙的自支撑电介质薄膜的散射数值模拟结果与实验数据基本吻合,可以认为造成反向散射峰增强的主要机理是来自平面的反射。介电-真空界面。由于给定的光路在两个不同的点上与粗糙的介电表面相互作用,因此相干相加,这是因为它从背面和与时间相反的部分进行部分反射,从而使回射方向上的散射强度相对于在其他方向上的散射强度。 [参考:18]

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