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TiS3 sheet based van der Waals heterostructures with a tunable Schottky barrier

机译:TiS3表基于范德华异质结构可调肖特基势垒

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Monolayer titanium trisulfide (TiS3), synthesized recently through exfoliation Adv. Mater., 2015, 27, 2595, has emerged as a new 2D material with outstanding electronic and optical properties. Here, using first- principles calculations we show for the first time the great potential of the TiS3 monolayer as a channel material when in contact with graphene and other 2D metallic materials to form van der Waals (vdW) heterostructures, where the intrinsic properties of both the TiS3 monolayer and the 2D materials are preserved, different from the conventional 3D metal/TiS3 semiconductor heterojunction Nanoscale, 2017, 9, 2068. Moreover, the TiS3 monolayer forms an n-type Schottky barrier (Phi(e)) when in contact with graphene, exhibiting a tunneling barrier and a negative band bending at the lateral interface; the Schottky barrier character can also be changed from n-type to p-type by doping graphene with boron atoms or replacing graphene with other high-work-function 2D metals, while a Schottky-barrier-free contact can be realized by doping graphene with nitrogen atoms, thus providing a solution to the contact-resistance problem in 2D electronics.
机译:单层钛三硫化物(TiS3),合成最近通过剥离[放置。27日,2595年),已成为一种新的二维材料杰出的电子和光学性质。这里,我们使用第一——原则计算第一次显示的巨大潜力在TiS3单层作为通道材料与石墨烯和其他二维金属就是secu * tanu减去vdW材料形成范德瓦耳斯()异质结构的内在属性的TiS3单层和二维材料有别于传统的3 d,保存吗金属/半导体异质结TiS3[纳米级,2017 9,2068]。单层形式n型肖特基势垒(φ(e))当接触石墨烯,展示隧穿势垒和消极的能带弯曲的侧界面;肖特基势垒的角色也可以改变通过掺杂石墨烯与n型和p型硼原子或取代石墨烯与其他high-work-function 2 d金属,而Schottky-barrier-free接触可以实现了与氮原子掺杂石墨烯,如此接触电阻提供解决方案问题2 d电子产品。

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