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Incorporation of small BN domains in graphene during CVD using methane, boric acid and nitrogen gas

机译:公司的小BN在石墨烯领域在CVD使用甲烷、硼酸和氮气体

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摘要

Chemical doping of graphene with small boron nitride (BN) domains has been shown to be an effective way of permanently modulating the electronic properties in graphene. Herein we show a facile method of growing large area graphene doped with small BN domains on copper foils using a single step CVD route with methane, boric acid powder and nitrogen gas as the carbon, boron and nitrogen sources respectively. This facile and safe process avoids the use of boranes and ammonia. Optical microscopy confirmed that continuous films were grown and Raman spectroscopy confirmed changes in the electronic structure of the grown BN doped graphene. Using XPS studies we find that both B and N can be substituted into the graphene structure in the form of small BN domains to give a B-N-C system. A novel structure for the BN doped graphene is proposed.
机译:化学掺杂石墨烯与小硼氮化(BN)域名已被证明是一个有效的永久调制方式在石墨烯的电子性质。一个灵巧的大面积生长石墨烯的方法掺杂小BN域使用铜薄片单步CVD的路线与甲烷,硼酸碳粉和氮气,硼和氮源分别。避免使用硼烷和安全的过程氨。连续电影种植和拉曼光谱证实了电子的变化种植BN掺杂石墨烯的结构。XPS研究我们发现B和N替换到石墨烯结构形式的小BN域给B-N-C系统。一个BN掺杂石墨烯的新型结构建议。

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