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Ultrahigh broadband photoresponse of SnO2 nanoparticle thin film/SiO2/p-Si heterojunction

机译:超高SnO2的宽带光响应纳米薄膜/二氧化硅/ p-Si异质结

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The SnO2/Si heterojunction possesses a large band offset and it is easy to control the transportation of carriers in the SnO2/Si heterojunction to realize high-response broadband detection. Therefore, we investigated the potential of the SnO2 nanoparticle thin film/SiO2/p-Si heterojunction for photodetectors. It is demonstrated that this heterojunction shows a stable, repeatable and broadband photoresponse from 365 nm to 980 nm. Meanwhile, the responsivity of the device approaches a high value in the range of 0.285-0.355 A W-1 with the outstanding detectivity of similar to 2.66 x 10(12) cm H-1/2 W-1 and excellent sensitivity of similar to 1.8 x 10(6) cm(2) W-1, and its response and recovery times are extremely short (<0.1 s). This performance makes the device stand out among previously reported oxide or oxide/Si based photodetectors. In fact, the photosensitivity and detectivity of this heterojunction are an order of magnitude higher than that of 2D material based heterojunctions such as (Bi2Te3)/Si and MoS2/graphene (photosensitivity of 7.5 x 10(5) cm(2) W-1 and detectivity of similar to 2.5 x 10(11) cm H-1/2 W-1). The excellent device performance is attributed to the large Fermi energy difference between the SnO2 nanoparticle thin film and Si, SnO2 nanostructure, oxygen vacancy defects and thin SiO2 layer. Consequently, practical highly-responsive broadband PDs may be actualized in the future.
机译:SnO2 /硅异质结具有一个大乐队抵消,很容易控制运输航空公司的SnO2 / Si异质结来实现高度响应宽带检测。SnO2纳米薄的潜力电影/二氧化硅/ p-Si异质结光电探测器。证明了这种异质结一个稳定、可重复的和宽带光响应从365纳米到980纳米。高反应性设备的方法值在0.285 - -0.355的w1的范围杰出的探测能力类似于2.66 x10(12)厘米H-1/2 w1和优秀的敏感性类似于1.8 x 10(6)厘米(2)w1,和它的响应和恢复时间都很短(< 0.1)。这种性能使得设备站在之前报道的氧化物或氧化/ Si基于光电探测器。光敏性和探测能力异质结高出一个数量级基于二维材料的垂直如(Bi2Te3) / Si和二硫化钼/石墨烯(7.5 x 10(5)厘米的光敏性(2)w1和探测能力类似于2.5 x 10(11)厘米H-1/2w1)。归因于费米能量差大SnO2纳米薄膜和硅之间,SnO2纳米结构、氧空位缺陷和薄二氧化硅层。积极响应宽带PDs可能实现在未来。

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