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首页> 外文期刊>Applied Spectroscopy: Society for Applied Spectroscopy >Contact Pressure Effects on Vibrational Bands of Kaolinite During Infrared Spectroscopic Measurements in a Diamond Attenuated Total Reflection Cell
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Contact Pressure Effects on Vibrational Bands of Kaolinite During Infrared Spectroscopic Measurements in a Diamond Attenuated Total Reflection Cell

机译:金刚石衰减全反射池中红外光谱测量过程中接触压力对高岭石振动带的影响

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摘要

Over the last decades infrared spectroscopy has become a frequently used method to investigate the structure and bonding properties of clay minerals. Along with classic transmission techniques, attenuated total reflection (ATR) spectroscopy has been applied as a very fast and easy method. In this study we compared transmission spectra of kaolinite with ATR spectra obtained by a single-reflection diamond ATR accessory (Golden Gate Mark II). The ATR spectra showed anomalous band positions that were obviously affected by the applied contact pressure of the sapphire anvil. Most of these vibrations can be assigned to basal Si-O bonds and all of them shifted their positions to lower wavenumbers. It is suggested that these peak shifts are due to changes in the Si-O-Si bond angle THETA. They are caused by distortions and rotations of SiO4 units within the tetrahedral sheet, due to shear forces perpendicular to the uniaxial pressure applied by the anvil. Furthermore, the intensity of a normally very weak transversal optical mode (TO mode) of the inner surface hydroxyls (3684 cm~(-1)) remarkably increased with increasing contact pressure, while the longitudinal optical mode (LO mode) at 3694 cm~(-1) strongly decreased its intensity. This possibly is determined by a strong alignment of the platy kaolinite particles along their ab-planes due to the applied pressure.
机译:在过去的几十年中,红外光谱已成为研究粘土矿物的结构和粘结性能的常用方法。与经典的传输技术一起,衰减全反射(ATR)光谱已被用作一种非常快速简便的方法。在这项研究中,我们将高岭石的透射光谱与单反射金刚石ATR附件(金门马克II)获得的ATR光谱进行了比较。 ATR光谱显示出异常的带位置,该位置明显受到蓝宝石砧施加的接触压力的影响。可以将这些振动中的大多数分配给基本的Si-O键,并将它们的位置都移至较低的波数。提示这些峰移动是由于Si-O-Si键角THETA的变化引起的。它们是由于垂直于砧座施加的单轴压力的剪切力,导致四面体薄片内的SiO4单元变形和旋转引起的。此外,内表面羟基(3684 cm〜(-1))的通常非常弱的横向光学模式(TO模式)的强度随着接触压力的增加而显着增加,而纵向光学模式(LO模式)在3694 cm〜 (-1)强烈降低其强度。这可能是由于所施加的压力使片状高岭石颗粒沿其ab面强烈对准而确定的。

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